Bis ethylcyclopentadienyl ruthenium
WebDec 1, 2024 · We have studied the atomic layer deposition (ALD) of ruthenium using bis(2,4-dimethylpentadienyl) ruthenium and oxygen. We show that the process is … WebCAS No. 220409-27-8: Bis(isopropylcyclopentadienyl) Ruthenium(II). Colonial Metals is a global supplier of chemical products and services. Call USA headquarters at 410-398 …
Bis ethylcyclopentadienyl ruthenium
Did you know?
WebP48 ECS Journal of Solid State Science and Technology, 2 (3) P47-P53 (2013) Table I. Summary of ALD-Ru results. Dep. Resistivity Growth Step Precursor Reactant Temp. ( C) Impurities (μ ·cm) rate (nm/cycle) coverage Refs.Ru(EtCp)2 NH3 plasma 300 - 16 0.18 - 9 NH3 plasma 270 - 12 0.038 - 18 O2 270 < 2 at.% C, O 15 0.15 Excellent [at 0.2 μm wide … WebProduct name : Bis(ethylcyclopentadienyl)ruthenium(II) Product Number : 648663 Brand : Aldrich CAS-No. : 32992-96-4 1.2 Relevant identified uses of the substance or mixture and uses advised against Identified uses : Laboratory chemicals, Synthesis of substances 1.3 Details of the supplier of the safety data sheet
WebMar 30, 2012 · Ru Films from Bis(ethylcyclopentadienyl)ruthenium Using Ozone as a Reactant by Atomic Layer Deposition for Capacitor Electrodes. Ja-Yong Kim 1, Deok-Sin … WebNov 20, 2024 · High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)ruthenium) and oxygen by thermal atomic layer deposition (ALD) and compared to magnetron sputtered (MS) Ru coatings. The ALD Ru film growth and surface roughness show a significant temperature dependence. At temperatures …
WebRuthenocene and bis(ethylcyclopentadienyl)ruthenium(II) and beta-diketonate ruthenium(II) compounds have been fairly extensively explored. Although these … WebJan 31, 2011 · 22 Aoyama, T. Eguchi, K.: Ruthenium films prepared by liquid source chemical vapor deposition using Bis-(ethylcyclopentadienyl)ruthenium. J. Appl. Phys. 38, L1134 1999 CrossRef Google Scholar. 23
WebOct 1, 1999 · Ruthenium (Ru) films were deposited by liquid source chemical vapor deposition using bis-(ethylcyclopentadienyl)ruthenium (Ru(C 2 H 5 C 5 H 4) 2). The crystalline structure, resistivity and residual impurities in the Ru films were investigated. The Ru films were polycrystalline and had a columnar structure; they showed a low resistivity …
WebBis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), 44-0040, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD Product Number: 98-4009 CAS Registry … earnshaws of horburyWebSECTION 1. IDENTIFICATION. Product Name: Bis(cyclopentadienyl)ruthenium Product Number: All applicable American Elements product codes, e.g. RU-BC5DE-025 , RU … ct100 boschWebAbout Bis (ethylcyclopentadienyl)nickel (II) Bis (ethylcyclopentadienyl)nickel (II) is generally immediately available in most volumes. High purity, submicron and … earnshaws nethertonWebOct 1, 2004 · T. Aoyama and K. Eguchi: Ruthenium films prepared by liquid source chemical vapor deposition using bis-(ethylcyclopentadienyl) ruthenium. J. Appl. Phys. 38, L1134 (1999). Article Google Scholar Download references. Author information. Authors and Affiliations. College of Nanoscale Science and Engineering, The University at Albany- … earnshaw n kaye mirfieldWebDelivered by Ingenta to: Yonsei University IP : 165.132.61.142 Thu, 10 Mar 2011 05:36:54 Ru 0.42 0 0 RESEARCH ARTICLE Jeong et al. Improved Oxygen Diffusion Barrier Properties of Ruthenium ... ct 100 price in india on roadWebJan 1, 2004 · Bis(ethylcyclopentadienyl)ruthenium (Ru(EtCp)2) is one of the commonly used metal precursors for Ru ALD. Using Ru(EtCp)2 and oxygen as reactants, Ru ALD was achieved at near 300°C. Here, we ... ct 100 price nashikWebBis(cyclopentadienyl)ruthenium C10H10Ru CID 102091 - structure, chemical names, physical and chemical properties, classification, patents, literature, biological activities, … ct1003